Researchers develop highly sensitive photoresist to enhance 3D nanofabrication

Researchers at Zhejiang University have developed a new cationic epoxy photoresist called TP-EO, which is 600 times more sensitive to two-photon laser exposure than the traditional SU-8 photoresist. This advancement allows for faster and more detailed 3D nanofabrication. The TP-EO photoresist can achieve a writing speed of 100 millimeters per second and create features as small as 170 nanometers. This performance surpasses existing cationic photoresists, enhancing the potential for complex microdevice applications. The new material successfully fabricated a topological liquid diode, demonstrating its capabilities for various uses, including optical elements and microfluidic devices. The findings were published in the journal Advanced Functional Materials.